Ofer Adan
Patterning Control Technology Head, Principal MTS at Applied Materials Israel Ltd
SPIE Involvement:
Conference Program Committee | Author | Editor | Instructor
Publications (44)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12955, 129551M (2024) https://doi.org/10.1117/12.3021163

Proceedings Article | 30 April 2023 Poster
Proceedings Volume 12496, 1249623 (2023) https://doi.org/10.1117/12.2669984
KEYWORDS: Overlay metrology, Scanning electron microscopy, Design and modelling, Metrology, Semiconducting wafers, Visibility, Shrinkage, Optical metrology, Design rules, Calibration

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12496, 124961S (2023) https://doi.org/10.1117/12.2672552

Proceedings Article | 26 May 2022 Presentation + Paper
Gaetano Santoro, Kevin Houchens, Janusz Bogdanowicz, Moshe Elizov, Lior Yaron, Michael Chemama, Alex Goldenshtein, Amit Zakay, Noam Amit, Basoene Briggs, Antoine Pacco, Romain Delhougne, Andrew Cockburn, Yaniv Abramovitz, Aviram Tam, Ofer Adan, Hans Mertens, Anne-Laure Charley, Naoto Horiguchi, Philippe Leray, Gian Francesco Lorusso
Proceedings Volume 12053, 120530L (2022) https://doi.org/10.1117/12.2613771
KEYWORDS: Transmission electron microscopy, Metrology, Scanning electron microscopy, Metals, 3D metrology, Molybdenum, Tin, Semiconducting wafers, Signal to noise ratio, Process control

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11611, 1161108 (2021) https://doi.org/10.1117/12.2588608

Showing 5 of 44 publications
Proceedings Volume Editor (4)

Conference Committee Involvement (19)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 19 Conference Committees
Course Instructor
SC1133: Advanced Concepts in Metrology Toolset Stability and Matching
The course covers advanced concepts for metrology toolset stability and matching. It will cover many critical topics that together maximize fleet performance. This is especially important given the shift to new device architectures (finfet, 3D Flash, DRAM and advanced memory ) that are challenging metrology toolsets in ways not seen before. A number of advanced concepts will be covered. Review best known methods for gauge study analysis and metrics. Appropriately setting up tool control chart limits for long term stability fleet matching based on requirements not historical data. Leveraging real time normalized product data to decrease Mean Time To Detect (MTTD) tool drifts. Recipe portability matching and monitoring to catch other issues that will affect lot cycletime. The concepts discussed are applicable to any metrology toolset such as CD-SEM, overlay, thin film, AFM, etc. and most of these concepts are also applicable to defect toolsets.
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