Ofer Adan
Senior Member of Technical Staff at Applied Materials Ltd
SPIE Involvement:
Conference Co-Chair | Conference Program Committee | Editor | Author | Instructor
Publications (36)

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Statistical analysis, Etching, Scanning electron microscopy, Line width roughness, Line edge roughness, Stochastic processes, Edge roughness

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Polymethylmethacrylate, Diffractive optical elements, Image segmentation, Image processing, Materials processing, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Semiconducting wafers

SPIE Journal Paper | July 3, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Transistors, Semiconducting wafers, Silicon, Scanning electron microscopy, Device simulation, Image segmentation, Resistance, Etching, Line width roughness, Data modeling

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Oxides, Electron beams, Metrology, Dielectrics, Silicon, Scanning electron microscopy, Silicon films, Boron, Semiconducting wafers, Nanowires

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Image segmentation, Atomic force microscopy, Optical testing, Scanning electron microscopy, 3D metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Back end of line

Showing 5 of 36 publications
Conference Committee Involvement (13)
Metrology, Inspection, and Process Control for Microlithography XXXIII
24 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Showing 5 of 13 published special sections
Course Instructor
SC1133: Metrology Toolset Monitoring, Matching, Maintenance and Management
This course explains basic and advanced principles of managing a toolset, also known as a fleet of metrology tools. This is especially important given the shift to new device architectures that are challenging metrology toolsets in ways not seen before. A primary goal of the course is to communicate these key challenges and derive their implications on heterogeneous and homogeneous fleets. The fleet management concepts discussed will provide the audience with improved methodologies to help qualify and monitor the fleet to ensure long term measurement stability and to ensure recipes run well across the fleet. The concepts discussed are applicable to any metrology toolset such as CD-SEM, overlay, thin film, AFM, etc and most of these concepts are also applicable to defect toolsets.
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