Ofer Adan
Senior Member of Technical Staff at Applied Materials Ltd
SPIE Involvement:
Conference Chair | Author | Editor | Instructor
Publications (38)

Proceedings Article | 25 June 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Wafer-level optics, Metrology, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Dysprosium, Line edge roughness, Semiconducting wafers, Overlay metrology, Scanning transmission electron microscopy

Proceedings Article | 24 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Wafer-level optics, Metrology, Etching, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019 Presentation
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Optical lithography, Etching, Inspection, Measurement devices, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Overlay metrology

Proceedings Article | 28 March 2016 Paper
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Statistical analysis, Etching, Scanning electron microscopy, Line width roughness, Line edge roughness, Stochastic processes, Edge roughness

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Polymethylmethacrylate, Diffractive optical elements, Image segmentation, Image processing, Materials processing, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Semiconducting wafers

Showing 5 of 38 publications
Proceedings Volume Editor (3)

Conference Committee Involvement (15)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
21 February 2021 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Showing 5 of 15 Conference Committees
Course Instructor
SC1133: Advanced Concepts in Metrology Toolset Stability and Matching
The course covers advanced concepts for metrology toolset stability and matching. It will cover many critical topics that together maximize fleet performance. This is especially important given the shift to new device architectures (finfet, 3D Flash, DRAM and advanced memory ) that are challenging metrology toolsets in ways not seen before. A number of advanced concepts will be covered. Review best known methods for gauge study analysis and metrics. Appropriately setting up tool control chart limits for long term stability fleet matching based on requirements not historical data. Leveraging real time normalized product data to decrease Mean Time To Detect (MTTD) tool drifts. Recipe portability matching and monitoring to catch other issues that will affect lot cycletime. The concepts discussed are applicable to any metrology toolset such as CD-SEM, overlay, thin film, AFM, etc. and most of these concepts are also applicable to defect toolsets.
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