Ofer Lindman
Product Engineer at Applied Materials Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Electron beam lithography, Reticles, Data modeling, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 12 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Detection and tracking algorithms, Data modeling, Visualization, Calibration, Databases, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Pattern recognition, Scanning electron microscopy, Photomasks, Computer aided design, Target recognition, Semiconducting wafers, Binary data, Solid modeling

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Reticles, Cadmium, Databases, Composites, Inspection, Inspection equipment, Photomasks, Critical dimension metrology, Tolerancing, System on a chip

Proceedings Article | 19 July 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Reticles, Defect detection, Ultraviolet radiation, Manufacturing, Inspection, Printing, Photomasks, Critical dimension metrology, Algorithm development, Semiconducting wafers

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