CONFERENCE PROCEEDINGS
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Oh-Sung Kwon
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (4)
PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Metrology, Logic, Scanning electron microscopy, Target acquisition, Semiconducting wafers, Performance modeling, Overlay metrology, Diffraction gratings
PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Environmental monitoring, Logic, Scanners, Interfaces, Control systems, High volume manufacturing, Critical dimension metrology, Semiconducting wafers
SPIE Journal Paper | March 29, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks
PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Distortion, Measurement devices, Photomasks, Overlay metrology, Instrument modeling
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