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Dr. Olena Romanets
at ASML
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 13 October 2021 Presentation + Paper
Optimizations aspects for EUV low-k1 logic with the low-n mask
Proceedings Volume 11854, 1185412 (2021) https://doi.org/10.1117/12.2600998
KEYWORDS: Photomasks, Diffraction, SRAF, Source mask optimization, Neodymium, Semiconducting wafers, Extreme ultraviolet, Logic, 3D image processing, Metals
SPIE Journal Paper | 21 May 2021
Investigation into a prototype extreme ultraviolet low-n attenuated phase-shift mask
Claire van Lare, Frank Timmermans, Jo Finders, Olena Romanets, Cheuk-Wah Man, Paul van Adrichem, Yohei Ikebe, Takeshi Aizawa, Takahiro Onoue
JM3, Vol. 20, Issue 02, 021006, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021006
KEYWORDS: Photomasks, Printing, Reflectivity, Extreme ultraviolet, Prototyping, Electroluminescence, Diffraction, Stochastic processes, Image enhancement, SRAF
Proceedings Article | 22 February 2021 Presentation
Investigation into a prototype EUV attenuated phase-shift mask
Claire van Lare, Frank Timmermans, Jo Finders, Olena Romanets, Cheuk-Wah Man, Paul van Adrichem, Yohei Ikebe, Takeshi Aizawa, Takahiro Onoue
Proceedings Volume 11609, 116090A (2021) https://doi.org/10.1117/12.2584725
Proceedings Article | 29 August 2019 Paper
Progress in imaging performance with EUV pellicles
O. Romanets, K. Ricken, M. Kupers, F. Wählisch, C. Piliego, P. Broman, D. de Graaf
Proceedings Volume 11177, 111770Z (2019) https://doi.org/10.1117/12.2535675
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Line width roughness
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