Olga Kobozeva
at Broadcom Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Metals, Image processing, Diffusion, Manufacturing, Photomasks, Transistors, Optical proximity correction, Semiconducting wafers, Design for manufacturability

PROCEEDINGS ARTICLE | July 12, 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Reticles, Logic, Etching, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

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