Mr. Oliver Brux
Global Product Manager at SUSS MicroTec
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Reticles, Carbon dioxide, Contamination, Scanners, Particles, Nickel, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Reticles, Contamination, Scanners, Particles, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Contamination, Scanners, Particles, Nickel, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Contamination, Particles, Inspection, Inspection equipment, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Fiber optic handling equipment

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