Dr. Olivier Allegre Profile

Dr. Olivier Allegre

at Univ of Manchester

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Proceedings Article | 2 March 2020 Paper

Ablation of amorphous Polyethy(ethyl)letone (PEEK) by a femtosecond Ti:sapphire laser

Qianliang Li, Walter Perrie, Yue Tang, Olivier Allegre, Janet Ho, Paul Chalker, Zhaoqing Li, Stuart Edwardson, Geoff Dearden

Proceedings Volume 11268, 112680L (2020) https://doi.org/10.1117/12.2543735

KEYWORDS: Absorption, Laser ablation, Polymers, Laser damage threshold, Laser processing

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Laser micro-machining of amorphous PEEK has been demonstrated with 180 fs/1 kHz NIR (775 nm) and NUV (387 nm) laser pulses. The single pulse ablation threshold was found to be 2.01 ± 0.05 J/cm² and 0.23 ± 0.02 J/cm² at 775 nm and 387 nm respectively. The significant difference in ablation threshold is due to the requirement for 3-photon absorption at 775 nm, where PEEK is transparent while significant linear absorption within the material bandgap occurs at 387 nm, enhancing 2-photon absorption. A high 2-photon absorption coefficient, measured to be β₃₈₇ ~ 38 cm GW^-1 supports this view while at the bandgap edge, 400 nm, β400 ~ 0.7 cm GW^-1. Multi-pulse exposure yields incubation coefficients of S₇₇₅ = 0.72 ± 0.01 and S₃₈₇ = 0.85 ± 0.02 hence incubation is significantly reduced in the NUV. Ablation of PEEK with NUV fs pulses demonstrates much reduced melting and re-deposition, thus precision NUV polymer micromachining is accomplished while laser induced periodic surface structures (LIPSS) with pitch Λ < 0.4 μm are observed at the base of ablated regions. Scanned areas exhibit white light diffraction due to this sub-micron periodic surface modulation. With the aid of a phase only spatial light modulator, multi-beam NUV micro-structuring is achieved, speeding micro-processing while reaching a line width < 4 μm with NA = 0.4 objective.

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