Olivier Guillaume
Resist & Track Process Engg at X-FAB France SAS
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Lithography, Sensors, Robotics, Process control, Critical dimension metrology, Chemical elements, Data communications, Semiconducting wafers, Wafer testing, Temperature metrology

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Calibration, Scanners, Diagnostics, Control systems, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Temperature metrology

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