Dr. Olivier Toublan
European Product Specialist at Mentor Graphics
SPIE Involvement:
Author
Publications (46)

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Photomasks, Calibration, Data modeling, Optical proximity correction, Etching, Error analysis, Printing, Electron beam lithography, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical proximity correction, SRAF, Lithography, Resolution enhancement technologies, Design for manufacturing, Photomasks, Computational lithography, Inspection, Manufacturing, Optical lithography

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Double patterning technology, Photomasks, Lithography, Metrology, Etching, Optical lithography, Algorithm development, Immersion lithography, Materials processing, Manufacturing

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: SRAF, Photomasks, Logic, Lithography, Optical proximity correction, Optical lithography, Model-based design, Printing, Inspection, Scanning electron microscopy

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Transistors, Device simulation, Calibration, Semiconducting wafers, Ions, Instrument modeling, Data modeling, Process modeling, Manufacturing, Electrochemical etching

Showing 5 of 46 publications
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