Omar Brioso
Sr. Applications Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Area of Expertise:
photolithography , semiconductor , optics , lasers
Publications (2)

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Infrared sensors, Lithography, Sensors, Calibration, Manufacturing, Signal processing, Optical alignment, Algorithm development, Semiconducting wafers, Overlay metrology

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Microscopes, Mirrors, Reticles, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

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