Mr. Omar Zurita
at Cymer LLC
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Light sources, Logic, Optical lithography, Modulation, Metals, Scanners, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Process control, Photomasks, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Light sources, Metrology, Optical lithography, Modulation, Polarization, Neodymium, Semiconducting wafers, Light

PROCEEDINGS ARTICLE | April 4, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Optical lithography, Modulation, Scatterometry, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Polarization, Scanners, Control systems, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Process control, Critical dimension metrology, Laser metrology, Semiconducting wafers, Light

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top