Omar Zurita
at Cymer LLC
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 25 March 2020 Presentation
Proc. SPIE. 11327, Optical Microlithography XXXIII

Proceedings Article | 4 September 2015 Paper
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Light sources, Logic, Optical lithography, Modulation, Metals, Scanners, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Light sources, Metrology, Optical lithography, Modulation, Polarization, Neodymium, Semiconducting wafers, Light

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Process control, Photomasks, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 April 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Optical lithography, Modulation, Scatterometry, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top