Dr. Omkaram Nalamasu
CTO at Applied Materials Inc
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 24 August 2001 Paper
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Polymers, Molecules, Image resolution, Silicon films, Solids, Analog electronics, Semiconducting wafers, Prototyping, Chemically amplified resists

Proceedings Article | 24 August 2001 Paper
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Polymers, Calcium, Chromophores, Nomenclature, Picosecond phenomena, Standards development, Information operations, Hassium, Chemically amplified resists

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Manufacturing, Printing, Photoresist materials, Microelectronics, Photomasks, Integrated circuits, Critical dimension metrology, Binary data, Phase shifts

Proceedings Article | 23 June 2000 Paper
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Modulation, Dry etching, Polymers, Molecules, Resistance, Printing, Polymerization, Photoresist processing, Standards development

Proceedings Article | 23 June 2000 Paper
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Switches, Imaging systems, Polymers, Spectroscopy, Molecules, Ions, Hydrogen, Clouds, Medium wave, Polymer thin films

Showing 5 of 37 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 16 May 1994

Conference Committee Involvement (2)
Nanofabrication: Technologies, Devices, and Applications II
23 October 2005 | Boston, MA, United States
Advances in Resist Technology and Processing XI
28 February 1994 | San Jose, CA, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top