Dr. Omkaram Nalamasu
CTO at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Author
Publications (38)

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Polymers, Molecules, Image resolution, Silicon films, Solids, Analog electronics, Semiconducting wafers, Prototyping, Chemically amplified resists

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Polymers, Calcium, Chromophores, Nomenclature, Picosecond phenomena, Standards development, Information operations, Hassium, Chemically amplified resists

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Manufacturing, Printing, Photoresist materials, Microelectronics, Photomasks, Integrated circuits, Critical dimension metrology, Binary data, Phase shifts

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Modulation, Dry etching, Polymers, Molecules, Resistance, Printing, Polymerization, Photoresist processing, Standards development

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Switches, Imaging systems, Polymers, Spectroscopy, Molecules, Ions, Hydrogen, Clouds, Medium wave, Polymer thin films

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: FT-IR spectroscopy, Polymers, Spectroscopy, Hydrogen, Silver, Clouds, Photoresist materials, Bismuth, Medium wave, Distributed interactive simulations

Showing 5 of 38 publications
Conference Committee Involvement (2)
Nanofabrication: Technologies, Devices, and Applications II
23 October 2005 | Boston, MA, United States
Advances in Resist Technology and Processing XI
28 February 1994 | San Jose, CA, United States
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