Dr. Onur Bakir
Principal Software Engineer at Cadence Design Systems Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Optical proximity correction, 3D modeling, SRAF, Diffraction, Data modeling, Semiconducting wafers, Calibration, Chlorine, Optical lithography

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