Opher Har-El
at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Oxides, Electron beams, Metrology, Silicon, Scanning electron microscopy, Time metrology, Signal processing, Process control, Critical dimension metrology, Semiconducting wafers

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