Orson Lin
at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Defect detection, Quartz, Manufacturing, Inspection, Chromium, Photomasks, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Diffractive optical elements, Etching, Quartz, Image processing, Chromium, Photomasks, Neodymium, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electronics, Etching, Manufacturing, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Edge roughness, Tin, Chemically amplified resists

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Calibration, Image segmentation, Manufacturing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Data modeling, Etching, Quartz, Coating, Manufacturing, Chromium, Photomasks, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Contamination, Etching, Quartz, Image processing, Coating, Chromium, Scanning electron microscopy, Photomasks, Optical alignment, Neodymium

Showing 5 of 6 publications
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