Orson Lin
at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 20 October 2006 Paper
Jerry Lu, Boster Wang, Frank Chen, Orion Wang, Jomarch Chou, Orson Lin, Jackie Cheng, Ellison Chen, Paul Yu
Proceedings Volume 6349, 63493K (2006) https://doi.org/10.1117/12.685660
KEYWORDS: Inspection, Photomasks, Defect detection, Quartz, Semiconducting wafers, Reticles, Lithography, Chromium, Resolution enhancement technologies, Manufacturing

Proceedings Article | 20 May 2006 Paper
Orson Lin, Jomarch Chou, K. K. Fu, Booky Lee, Richard Lu, Jerry Lu, Chiang-Lin Shi
Proceedings Volume 6283, 62831S (2006) https://doi.org/10.1117/12.681754
KEYWORDS: Etching, Photomasks, Chromium, Resolution enhancement technologies, Neodymium, Quartz, Image processing, Diffractive optical elements, Phase shifts, Binary data

Proceedings Article | 8 November 2005 Paper
Gordon Chan, Orson Lin, Wesen Tseng, Booky Lee, Torey Huang, Makoto Kozuma
Proceedings Volume 5992, 59923B (2005) https://doi.org/10.1117/12.632052
KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Photoresist processing, Etching, Manufacturing, Edge roughness, Chemically amplified resists, Tin, Electronics

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59921Z (2005) https://doi.org/10.1117/12.632211
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Semiconductors, Image segmentation

Proceedings Article | 28 June 2005 Paper
Orson Lin, Richard Hung, Booky Lee, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Jengping Lin, Michael Hsu, Stephen Hsu
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617230
KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Manufacturing, Resolution enhancement technologies, Etching, Data modeling, Quartz, Chromium, Coating

Showing 5 of 6 publications
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