Dr. Osamu Inoue
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (21)

SPIE Journal Paper | 13 June 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Overlay metrology, Scanning electron microscopy, Metrology, Semiconducting wafers, Etching, Selenium, Signal detection, Edge detection, Manufacturing, Scanners

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Metrology, Logic, Statistical analysis, Etching, Germanium, Resistance, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Algorithm development, Overlay metrology, Standards development, Back end of line

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Edge detection, Metrology, Statistical analysis, Calibration, Etching, Reliability, Resistance, Magnetism, Electron microscopes, Process control, Critical dimension metrology, Semiconducting wafers, Lawrencium

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silica, Sensors, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 April 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Wafer-level optics, Etching, Metals, Scanners, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, Optics manufacturing, Overlay metrology, Tin

Showing 5 of 21 publications
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