Osamu Morimoto
at Canon Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 1185509 (2021) https://doi.org/10.1117/12.2601937
KEYWORDS: Distortion, Photomasks, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11610, 1161007 (2021) https://doi.org/10.1117/12.2584720
KEYWORDS: Nanoimprint lithography, Manufacturing, Computational lithography, Semiconductors, Semiconductor manufacturing, Optical lithography, Semiconducting wafers, Photomasks, Ultraviolet radiation, Physics

Proceedings Article | 21 September 2020 Presentation
Proceedings Volume 11518, 115180V (2020) https://doi.org/10.1117/12.2574629
KEYWORDS: Nanoimprint lithography, Photomasks, Manufacturing, Optical lithography, Stochastic processes, Computational lithography, Semiconductor manufacturing, Semiconductors, Photoresist processing, Ultraviolet radiation

Proceedings Article | 26 September 2019 Presentation + Paper
Osamu Morimoto, Takehiko Iwanaga, Yukio Takabayashi, Keita Sakai, Wei Zhang, Anshuman Cherala, Se-Hyuk Im, Mario Meissl, Jin Choi
Proceedings Volume 11148, 111480M (2019) https://doi.org/10.1117/12.2535912
KEYWORDS: Photomasks, Optical lithography, Nanoimprint lithography, Stochastic processes, Semiconductor manufacturing, Particles, Semiconducting wafers, Lithography, Manufacturing equipment, Capillaries

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