Osamu Nozawa
at HOYA Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Proceedings Article | 28 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Optical lithography, Quartz, Silicon, Humidity, Transmittance, Photomasks, Excimer lasers, Molybdenum, Phase shifts, Oxidation

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Etching, Silicon, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Tantalum, Binary data, Scanning transmission electron microscopy

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Polishing, Glasses, Silicon, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Defect inspection

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Silicon, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Photoresist processing, Defect inspection

Showing 5 of 10 publications
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