Osamu Nozawa
at HOYA Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 28 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Optical lithography, Quartz, Silicon, Humidity, Transmittance, Photomasks, Excimer lasers, Molybdenum, Phase shifts, Oxidation

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Etching, Silicon, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Tantalum, Binary data, Scanning transmission electron microscopy

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Polishing, Glasses, Silicon, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Defect inspection

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Silicon, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Photoresist processing, Defect inspection

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Multilayers, Etching, Dry etching, Silicon, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Etching, Dry etching, Inspection, Chromium, Transmittance, Photomasks, Fluorine, Plasma, Phase shifts

Showing 5 of 9 publications
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