Osamu Suga
Manager at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Publications (68)

SPIE Journal Paper | 27 February 2012
JM3, Vol. 11, Issue 1, 013002, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013002
KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 81660G (2011) https://doi.org/10.1117/12.898898
KEYWORDS: Inspection, Photomasks, Defect detection, Multilayers, Extreme ultraviolet lithography, Imaging systems, Transmission electron microscopy, Semiconducting wafers, Light scattering, Atomic force microscopy

SPIE Journal Paper | 1 October 2011
JM3, Vol. 10, Issue 04, 043006, (October 2011) https://doi.org/10.1117/12.10.1117/1.3644984
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 797123 (2011) https://doi.org/10.1117/12.879346
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Extreme ultraviolet, Wafer inspection, Defect inspection, Line width roughness, Image processing, Signal to noise ratio

Proceedings Article | 8 April 2011 Paper
Kazuya Ota, Masami Yonekawa, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga
Proceedings Volume 7969, 79691V (2011) https://doi.org/10.1117/12.879553
KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Electrodes, Photomasks, Particle contamination, Resistance, Dielectric polarization

Showing 5 of 68 publications
Conference Committee Involvement (2)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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