Osamu Suga
Manager at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (68)

SPIE Journal Paper | 27 February 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Inspection, Photomasks, Defect detection, Multilayers, Extreme ultraviolet lithography, Imaging systems, Transmission electron microscopy, Semiconducting wafers, Light scattering, Atomic force microscopy

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Extreme ultraviolet, Wafer inspection, Defect inspection, Line width roughness, Image processing, Signal to noise ratio

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Electrodes, Photomasks, Particle contamination, Resistance, Dielectric polarization

Showing 5 of 68 publications
Conference Committee Involvement (2)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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