Osamu Suga
Manager at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (68)

SPIE Journal Paper | 27 February 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Defect detection, Imaging systems, Light scattering, Inspection, Atomic force microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Signal to noise ratio, Defect detection, Image processing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Defect inspection

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Electrodes, Particles, Resistance, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Dielectric polarization

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Photovoltaics, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers, Overlay metrology

Showing 5 of 68 publications
Conference Committee Involvement (2)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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