Mr. Osamu Tamada
Assistant Manager at Screen Holdings Co Ltd
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Metrology, Coating, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Cameras, Image processing, Video, Coating, Scanning electron microscopy, High speed cameras, Extreme ultraviolet, Thin film coatings, Semiconducting wafers, Content addressable memory

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Defect detection, Coating, Scanning electron microscopy, Bridges, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Contamination, Scanners, Particles, Coating, Inspection, Printing, Semiconductor manufacturing, Immersion lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Diffractive optical elements, Particles, Silicon, Coating, Inspection, Scanning electron microscopy, Immersion lithography, Thin film coatings, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Particles, Interfaces, Silicon, Atomic force microscopy, Solids, Excimers, Immersion lithography, Niobium, Stereolithography, Liquids

Showing 5 of 15 publications
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