Osamu Tamada
Assistant Manager at Screen Holdings Co Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Metrology, Coating, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Cameras, Image processing, Video, Coating, Scanning electron microscopy, High speed cameras, Extreme ultraviolet, Thin film coatings, Semiconducting wafers, Content addressable memory

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Defect detection, Coating, Scanning electron microscopy, Bridges, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Contamination, Scanners, Particles, Coating, Inspection, Printing, Semiconductor manufacturing, Immersion lithography, Semiconducting wafers

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Diffractive optical elements, Particles, Silicon, Coating, Inspection, Scanning electron microscopy, Immersion lithography, Thin film coatings, Semiconducting wafers

Showing 5 of 15 publications
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