Dr. Osamu Wakabayashi
Researcher at EUVA
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Laser systems engineering, Tin

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Ions, Laser development, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Laser systems engineering, Tin

Proceedings Article | 11 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Light sources, Oscillators, High power lasers, Error analysis, Laser applications, Laser development, Power supplies, Laser stabilization, Excimer lasers, Double patterning technology

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Prisms, Transparency, Interferometers, Chemical species, Molecules, Immersion lithography, Fluorine, Semiconducting wafers, Liquids

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Optical components, Lithography, Light sources, Resonators, Electrodes, Reliability, Magnetism, Amplifiers, Gas lasers, Excimer lasers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reflectors, Lithography, Laser development, Computer simulations, Gas lasers, Excimer lasers, Immersion lithography, Acoustics, Pulsed laser operation, Laser countermeasures

Showing 5 of 33 publications
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