Prof. Osamu Wakimoto
at JEOL Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 25, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electronics, Manufacturing, Reliability, Inspection, Magnetism, Diagnostics, Data processing, Photomasks, System integration, Environmental sensing

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Electronics, Error analysis, Inspection, Magnetism, Diagnostics, Amplifiers, Data processing, Photomasks, System integration, Signal detection

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Data storage, Reliability, Computing systems, Control systems, Data processing, Photomasks, Optical proximity correction, Digital recording, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Environmental monitoring, Reliability, Inspection, Diagnostics, Amplifiers, Data processing, Photomasks, Analog electronics, System integration, Signal detection

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