Dr. Oscar Noordman
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mirrors, Diffractive optical elements, Fiber optic illuminators, Source mask optimization, Imaging systems, Electroluminescence, Polarization, Semiconducting wafers, Photomasks, Light

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Diffractive optical elements, Fiber optic illuminators, Reticles, Lithographic illumination, Mirrors, Critical dimension metrology, Distortion, Source mask optimization, Manufacturing, Semiconducting wafers

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Mirrors, Fiber optic illuminators, Diffractive optical elements, Source mask optimization, Micromirrors, Light, Metrology, Semiconducting wafers, Switching, Scanners

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Speckle, Speckle pattern, Line width roughness, Reticles, Optical lithography, Semiconducting wafers, Temporal coherence, Pulsed laser operation, Spatial coherence, Spatial frequencies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Speckle, Line width roughness, Speckle pattern, Reticles, Temporal coherence, Semiconducting wafers, Optical lithography, Pulsed laser operation, Spatial frequencies, Spatial coherence

Showing 5 of 11 publications
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