Dr. Oseo Park
SPIE Involvement:
Publications (8)

Proceedings Article | 17 April 2020 Presentation + Paper
Cheng Chi, Hao Tang, Oseo Park, Jing Xue, Jing Guo, Geng Han, Charlie King, Jeff Shearer, Sean Burns
Proceedings Volume 11327, 113270E (2020) https://doi.org/10.1117/12.2550834
KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Data modeling, Yield improvement, Optics manufacturing, Optical lithography, Deep ultraviolet, Logic

SPIE Journal Paper | 7 February 2017
Kafai Lai, Chi-Chun Liu, Hsinyu Tsai, Yongan Xu, Cheng Chi, Ananthan Raghunathan, Parul Dhagat, Lin Hu, Oseo Park, Sunggon Jung, Wooyong Cho, Jaime Morillo, Jed Pitera, Kristin Schmidt, Mike Guillorn, Markus Brink, Daniel Sanders, Nelson Felix, Todd Bailey, Matthew Colburn
JM3, Vol. 16, Issue 01, 013502, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013502
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71221Q (2008) https://doi.org/10.1117/12.801695
KEYWORDS: Optical proximity correction, Diffusion, Data modeling, Optimization (mathematics), Calibration, Critical dimension metrology, Cadmium, Semiconducting wafers, Model-based design, Photoresist processing

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65203Q (2007) https://doi.org/10.1117/12.712197
KEYWORDS: Optical proximity correction, Photomasks, Critical dimension metrology, Data modeling, Performance modeling, Phase shifts, Reticles, Lithography, Dry etching, Semiconducting wafers

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59922Q (2005) https://doi.org/10.1117/12.630758
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Distortion, Critical dimension metrology, SRAF, Lithography, Diffusion, Apodization

Showing 5 of 8 publications
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