Oskar Hofmann
Chair for Technology of Optical Systems at RWTH Aachen Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Microscopes, Mirrors, Multilayers, Reflection, Scattering, Silicon, Light scattering, Inspection, Photomasks, Extreme ultraviolet

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