Otto Meijer
Senior Staff R&E Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Electron beam lithography, Data storage, Graphics processing units, Manufacturing, Photomasks, Maskless lithography, Raster graphics, Data conversion, Semiconducting wafers

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