Dr. Ovadya Menadeva
at Applied Materials
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Etching, Manufacturing, Line width roughness, Transistors, Optical proximity correction, Computer aided design, Semiconducting wafers, Device simulation, Electrochemical etching

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Data modeling, Calibration, Ions, Manufacturing, Transistors, Semiconducting wafers, Process modeling, Device simulation, Electrochemical etching, Instrument modeling

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Photoresist materials, Process control, Design for manufacturing, Line width roughness, Transistors, Optical proximity correction, Line edge roughness, Photoresist developing

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Etching, Ions, Manufacturing, Scanning electron microscopy, Transistors, Optical proximity correction, Computer aided design, Semiconducting wafers, Device simulation, Electrochemical etching

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Environmental monitoring, Calibration, Scanning electron microscopy, Finite element methods, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers, Electrochemical etching

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Atrial fibrillation, Metals, Pattern recognition, Process control, Optical proximity correction, Optical alignment, Computer aided design, Target recognition, Semiconducting wafers

Showing 5 of 17 publications
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