Dr. P. Jeffrey Ungar
Chief Scientist at D2S Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 7 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020

Proceedings Article | 31 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 March 2020 Presentation
Proc. SPIE. 11327, Optical Microlithography XXXIII

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Lithography, Manufacturing, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Design for manufacturability

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Diffraction, Optical lithography, Printing, Near field, Ray tracing, Neural networks, Photomasks, Optical simulations, Optical proximity correction, 3D image processing

Showing 5 of 8 publications
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