Mr. Paolo Alagna
Sr. Europe Applications Manager
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Temporal coherence, Lithography, Light sources, Metrology, Optical lithography, Etching, Line width roughness, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | May 1, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Light sources, Optical lithography, Deep ultraviolet, Modulation, Scanners, Inspection, Immersion lithography, Image contrast enhancement, Semiconducting wafers

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Light sources, Metrology, Optical lithography, Deep ultraviolet, Manufacturing, Photomasks, Semiconductor manufacturing, Double patterning technology, Immersion lithography, Source mask optimization, Optical proximity correction, Image contrast enhancement, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Light sources, Optical lithography, Data modeling, Scanners, Manufacturing, Control systems, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Data modeling, Deep ultraviolet, Etching, Metals, Electroluminescence, Optical proximity correction

Showing 5 of 12 publications
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