Paolo Alagna
Sr. Europe Applications Manager
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Temporal coherence, Lithography, Light sources, Metrology, Optical lithography, Etching, Line width roughness, Line edge roughness, Semiconducting wafers

Proceedings Article | 1 May 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Light sources, Optical lithography, Deep ultraviolet, Modulation, Scanners, Inspection, Immersion lithography, Image contrast enhancement, Semiconducting wafers

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Light sources, Metrology, Optical lithography, Deep ultraviolet, Manufacturing, Photomasks, Semiconductor manufacturing, Double patterning technology, Immersion lithography, Source mask optimization, Optical proximity correction, Image contrast enhancement, Semiconducting wafers

Proceedings Article | 23 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Light sources, Optical lithography, Data modeling, Scanners, Manufacturing, Control systems, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Overlay metrology

Showing 5 of 12 publications
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