We propose a waveguide integrated plasmonic platform in order to deliver excitation power to and collect signal
efficiently from a nanoantenna. The system consists of a silicon waveguide with an integrated nanoantenna and a fiber
spot size converter. The nanoantenna is designed to have a broad resonance around 1.5 microns with an estimated
surface enhanced Raman scattering (SERS) enhancement of 6 orders of magnitude and collection efficiency up to 80%.
The device is fabricated on a silicon-on-insulator (SOI) wafer. The proposed and fabricated device can be used in
applications such as on-chip SERS spectroscopy, infrared spectroscopy and gas sensing.
Suspended silicon based nanostructures for optomechanic applications have been successfully fabricated using the
Hydrofluoric acid (HF) vapor phase etching technique. In this paper, we demonstrate the fabrication of parallel silicon
waveguides with a cross section of 250nm x 220nm, and photonic crystal nanobeam cavities with an air gap as small as
50nm between these released structures. The waveguides have been suspended over a distance of more than 75um.
Stiction is a major issue for releasing structures with gaps in the order of tens of nanometers. At the same time, the
process has to be gentle due to the small dimensions of the structures involved in the release process. HF vapor etching
technique was successfully utilized to etch the 2um thick thermally grown sacrificial silicon oxide layer. This process
has an high yield as no liquid is in contact with the structures being released, thus eliminating any kind of liquid flow
which typically proves to be a potential destruction source for such small structures. This HF vapor phase etching is a
simple and controllable process which completely eliminates the requirement of any kind of sophisticated drying
techniques needed with conventional wet etching.