Pary Baluswamy
Technology Transfer Manager
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconducting wafers, Data modeling, Statistical modeling, Overlay metrology, Statistical analysis, Error analysis, High volume manufacturing, Process control, Metrology, Feedback control

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Line edge roughness, Polarization, Birefringence, Photomasks, Optical lithography, Cadmium, 193nm lithography

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Scanners, Projection lithography, Semiconducting wafers, Lithography, Sensors, Photomasks, Optical scanning systems, Photoresist processing, Refractive index, Binary data

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Pellicles, Semiconducting wafers, Reflectivity, Thin films, Lenses, Scanners, Lithography, Light scattering, Image processing, Coating

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Calibration, Data modeling, Diffusion, Cadmium sulfide, Refractive index, Semiconducting wafers, Process modeling, Lithography, Monochromatic aberrations, Optimization (mathematics)

Showing 5 of 7 publications
Conference Committee Involvement (12)
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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