Dr. Pascal Meyer Profile

Dr. Pascal Meyer

at Karlsruher Institut fuer Technologie

SPIE Involvement:

Author

Publications (9)

SPIE Journal Paper | 14 February 2024 Open Access

Stabilizing high aspect ratio x-ray gratings with top layer resist grid

Michael Richter, Thomas Beckenbach, Constantin Rauch, Stephan Schreiner, Marcus Zuber, Elias Hamann, Arndt Last, Martin Börner, Jan Korvink, Pascal Meyer

JM3, Vol. 23, Issue 01, 014901, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014901

KEYWORDS: Bridges, X-rays, Gold, Scanning electron microscopy, Metals, Electroplating, Nickel, Photoresist processing, Fabrication, Optical gratings

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Proceedings Article | 14 October 2022 Presentation + Paper

Recent progress in grating-based microscopic x-ray phase tomography

Atsushi Momose, Ryosuke Ueda, Mingjian Cai, Zhuoxuan Zhao, Sam Kalirai, Maderych Stan, Jeff Irwin, Hiroki Kawakami, Pouria Zangi, Pascal Meyer, Martin Börner, Joachim Schulz

Proceedings Volume 12242, 1224210 (2022) https://doi.org/10.1117/12.2636393

KEYWORDS: X-rays, X-ray imaging, Interferometers, Sensors, Microscopes, Phase imaging, Super resolution, X-ray detectors, Spatial resolution, Image sensors

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SPIE Journal Paper | 25 May 2022 Open Access

Investigation on the mechanical interface stability of curved high aspect ratio x-ray gratings made by deep x-ray lithography

Michael Richter, Thomas Beckenbach, Heiner Daerr, Sven Prevrhal, Martin Börner, Josephine Gutekunst, Pouria Zangi, Arndt Last, Jan Korvink, Pascal Meyer

JM3, Vol. 21, Issue 02, 024901, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024901

KEYWORDS: X-rays, Interfaces, Semiconducting wafers, X-ray lithography, X-ray imaging, X-ray detectors, Metals, Manufacturing, X-ray sources, Silicon

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SPIE Journal Paper | 4 October 2021

Fabrication of x-ray absorption gratings via deep x-ray lithography using a conventional x-ray tube

Simon Pinzek, Thomas Beckenbach, Manuel Viermetz, Pascal Meyer, Alex Gustschin, Jana Andrejewski, Nikolai Gustschin, Julia Herzen, Joachim Schulz, Franz Pfeiffer

JM3, Vol. 20, Issue 04, 043801, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.043801

KEYWORDS: X-rays, X-ray lithography, Absorption, Synchrotrons, Photomasks, Gold, X-ray imaging, Bridges, Image transmission, Electroplating

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SPIE Journal Paper | 15 May 2019 Open Access

Influence of secondary effects in the fabrication of submicron resist structures using deep x-ray lithography

Abrar Faisal, Thomas Beckenbach, Jürgen Mohr, Pascal Meyer

JM3, Vol. 18, Issue 02, 023502, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.023502

KEYWORDS: X-ray lithography, Photomasks, Gold, X-rays, Photoresist materials, Near field diffraction, Titanium, Electrons, Photons, Scanning electron microscopy

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SPIE Journal Paper | 12 January 2017

Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging

Tobias Schröter, Frieder Koch, Pascal Meyer, Martin Baumann, Daniel Münch, Danays Kunka, Sabine Engelhardt, Marcus Zuber, Tilo Baumbach, Jürgen Mohr

JM3, Vol. 16, Issue 01, 013501, (January 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013501

KEYWORDS: Photomasks, X-rays, X-ray imaging, Synchrotrons, Scanners, Visibility, Gold, Sensors, Phase shifts, Interferometers

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SPIE Journal Paper | 17 October 2016

Deep proton writing with 12 MeV protons for rapid prototyping of microstructures in polymethylmethacrylate

Evert Ebraert, Berkcan Gökçe, Sandra Van Vlierberghe, Michael Vervaeke, Pascal Meyer, Markus Guttmann, Peter Dubruel, Hugo Thienpont, Jürgen Van Erps

JM3, Vol. 15, Issue 04, 044501, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.044501

KEYWORDS: Polymethylmethacrylate, Rapid manufacturing, Surface roughness, Prototyping, Photomasks, Nickel, Optical alignment, Single mode fibers, Connectors, Etching

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Proceedings Article | 19 March 2014 Paper

Increasing the field of view of x-ray phase contrast imaging using stitched gratings on low absorbent carriers

J. Meiser, M. Amberger, M. Willner, D. Kunka, P. Meyer, F. Koch, A. Hipp, M. Walter, F. Pfeiffer, J. Mohr

Proceedings Volume 9033, 903355 (2014) https://doi.org/10.1117/12.2043479

KEYWORDS: Silicon, X-rays, Phase contrast, X-ray imaging, Semiconducting wafers, Absorption, Biomedical optics, Scattering, Interferometry, Image restoration

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Proceedings Article | 30 August 1999 Paper

Development behavior of irradiated foils and microstructures

Pascal Meyer, Aida El-Kholi, Juergen Mohr, Clifford Cremers, Faycal Bouamrane, Stephan Megtert

Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361235

KEYWORDS: Polymethylmethacrylate, X-ray lithography, X-rays, Synchrotron radiation, Photomasks, Metals, Photoelectric effect, Polymers, Electroplating, Fabrication

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Showing 5 of 9 publications

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