Mr. Patrick J. LaCour
Product Engineer at
SPIE Involvement:
Author
Publications (34)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Visualization, Composites, Silicon, Manufacturing, Printing, Photomasks, Semiconductor manufacturing, Acquisition tracking and pointing, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Liquid phase epitaxy, Manufacturing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Process modeling

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Logic, Liquid phase epitaxy, Manufacturing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Process modeling

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Manufacturing, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Manufacturing equipment, Current controlled current source

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Visualization, Metals, Image processing, Manufacturing, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 34 publications
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