Patricia Marmillion
Project Engineer
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Manufacturing, Pellicles, Printing, Data processing, Microelectronics, Photomasks, Optical proximity correction, Data conversion, Binary data, Phase shifts

Proceedings Article | 1 April 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Quartz, Glasses, Particles, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Cavitation, Acoustics, Surface finishing

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Quartz, Particles, Ions, Chemistry, Photomasks, Extreme ultraviolet lithography, Scanning probe microscopy, Vacuum ultraviolet, Mask cleaning, Liquids

Proceedings Article | 23 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Logic, Glasses, Manufacturing, Inspection, Pellicles, Data processing, Photomasks, Optical proximity correction, Photomask technology, Binary data

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Quartz, Particles, Hydrogen, Inspection, Photomasks, Extreme ultraviolet, Acquisition tracking and pointing, Standards development, Defect inspection

Showing 5 of 18 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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