Dr. Patricia Pimenta-Barros
at Cea;Leti
SPIE Involvement:
Publications (28)

Proceedings Article | 19 March 2018 Presentation + Paper
Isabelle Servin, Patricia Pimenta-Barros, Arthur Bernadac, Jonathan Pradelles, Allan Germain, Yoann Blancquaert, Philippe Essomba, Stefan Landis, Gerard ten Berge, Marco Wieland, Philippe Brun
Proceedings Volume 10584, 1058411 (2018) https://doi.org/10.1117/12.2297162
KEYWORDS: Etching, Semiconducting wafers, Lithography, Scanning electron microscopy, System on a chip, Optical alignment, Electron beam lithography, Metals, Back end of line, Copper

Proceedings Article | 19 March 2018 Presentation + Paper
A. Gharbi, P. Pimenta-Barros, O. Saouaf, G. Reynaud, L. Pain, R. Tiron, C. Navarro, C. Nicolet, I. Cayrefourcq, M. Perego, F. Pérez-Murano, E. Amat, M. Fernández-Regúlez
Proceedings Volume 10586, 105860Q (2018) https://doi.org/10.1117/12.2297414
KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Directed self assembly, Annealing, Etching, Scanning electron microscopy, Dry etching, Silicon, Lithography, Plasma etching

Proceedings Article | 19 March 2018 Paper
P. Pimenta-Barros, G. Claveau, M. Argoud, Z. Chalupa, N. Allouti, C. Comboroure, G. Chamiot-Maitral, N. Posseme, L. Pain, R. Tiron, C. Navarro, C. Nicolet, I. Cayrefourcq
Proceedings Volume 10584, 105840C (2018) https://doi.org/10.1117/12.2297407
KEYWORDS: Etching, Silicon, Ultraviolet radiation, Directed self assembly, Polymethylmethacrylate, Scanning electron microscopy, Plasma, Nanowires, Line width roughness, Surface properties

Proceedings Article | 19 March 2018 Presentation
Ahmed Gharbi, Florian DELACHAT, Patricia Pimenta-Barros, Gaëlle Chamiot-Maitral, Maxime Argoud, Celine Lapeyre, Laurent Pain, Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, Raluca Tiron
Proceedings Volume 10584, 105840D (2018) https://doi.org/10.1117/12.2297422
KEYWORDS: Directed self assembly, Optical lithography, Critical dimension metrology, Silicon, Oxides, Semiconducting wafers, Semiconductors, Materials processing, Photomasks, Photoresist processing

Proceedings Article | 10 April 2017 Presentation + Paper
S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, L. Pain
Proceedings Volume 10149, 101490K (2017) https://doi.org/10.1117/12.2259966
KEYWORDS: Directed self assembly, Lithography, Line width roughness, Nanoimprint lithography, Semiconducting wafers, Etching, Electron beam lithography, System on a chip, Critical dimension metrology, Photoresist processing

Showing 5 of 28 publications
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