Dr. Patrick Helfenstein
at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | October 15, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Diffraction, Reticles, Inspection, Image restoration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, System on a chip, Defect inspection

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Diffraction, Reticles, Scattering, Coating, Inspection, Pellicles, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Signal to noise ratio, Mirrors, Optical properties, Nickel, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase measurement, Absorption

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Microscopes, Inspection, Reflectivity, Deconvolution, Extreme ultraviolet, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Microscopes, Diffraction, Reticles, Silicon, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reconstruction algorithms

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Signal to noise ratio, Diffraction, Reticles, Defect detection, Sensors, Inspection, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Defect inspection

Showing 5 of 14 publications
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