Dr. Patrick A. Kearney
at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (67)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reflectors, Lithography, Multilayers, Interfaces, Silicon, Optical coatings, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Molybdenum, Ruthenium

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Multilayers, Sputter deposition, Silicon, Manufacturing, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Silica, Manufacturing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Ruthenium, Standards development

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Reflectors, Multilayers, Ions, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Ruthenium

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Optical lithography, Imaging systems, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Titanium dioxide, Nickel, Silicon, Chemistry, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium

Showing 5 of 67 publications
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