Mr. Patrick Lomtscher
at Qoniac GmbH
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Double patterning technology, Critical dimension metrology, Molybdenum, Semiconducting wafers, Overlay metrology, Information operations

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Interferometers, Wavefronts, Projection systems, Semiconducting wafers, Phase shifts, Diffraction gratings

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top