Mr. Patrick Lomtscher Profile

Patrick Lomtscher

at Qoniac GmbH

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Author

Publications (3)

PROCEEDINGS ARTICLE | March 13, 2018

Advanced combined overlay and CD uniformity measurement mark for double patterning

Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII

KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Double patterning technology, Critical dimension metrology, Molybdenum, Semiconducting wafers, Overlay metrology, Information operations

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PROCEEDINGS ARTICLE | March 13, 2018

Higher order intra-field alignment for intra-wafer lens and reticle heating control

Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII

KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

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PROCEEDINGS ARTICLE | May 12, 2004

Long-term Zernike lens aberration measurement

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Interferometers, Wavefronts, Projection systems, Semiconducting wafers, Phase shifts, Diffraction gratings

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