Patrick Lomtscher
at Qoniac GmbH
SPIE Involvement:
Publications (10)

Proceedings Article | 10 April 2024 Poster + Paper
Alberto Lopez-Gomez, Stefan Buhl, Eric Jehnes, Patrick Lomtscher, Manuela Gutsch, Xaver Thrun, Clemens Utzny, Philip Groeger, Johannes Kowalewski
Proceedings Volume 12955, 129553T (2024)
KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Modeling, Interpolation, High volume manufacturing, Data modeling, Performance modeling, Mixtures

Proceedings Article | 22 February 2021 Presentation + Paper
Jia Hung Chang, En Chuan Lio, Junjin Lin, Tang Chun Weng, Bill Lin, Patrick Lomtscher, Martin Freitag, Stefan Buhl, Hsiao Lin Hsu, Rex Liu
Proceedings Volume 11613, 116130K (2021)

Proceedings Article | 23 March 2020 Paper
Boris Habets, Stefan Buhl, Wan-Soo Kim, Patrick Lomtscher, Holger Bald, Tobias Hoeer
Proceedings Volume 11327, 113270U (2020)
KEYWORDS: Semiconducting wafers, Data modeling, Performance modeling, Overlay metrology, Computer simulations, Data corrections, Metrology, Statistical modeling, Neodymium, Statistical analysis

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 113251Y (2020)
KEYWORDS: Distortion, Semiconducting wafers, Optical alignment, Optimization (mathematics), Scanners, Overlay metrology, Process control, Reticles, Data modeling

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109592P (2019)
KEYWORDS: Overlay metrology, Etching, Device simulation, Feedback control, Lithography, Measurement devices, Semiconducting wafers, Control systems, High volume manufacturing, Inspection

Showing 5 of 10 publications
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