Patrick Lomtscher
at Qoniac GmbH
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Metrology, Data modeling, Manufacturing, Computer simulations, Optical alignment, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Reticles, Data modeling, Visualization, Optical alignment, Optimization (mathematics), Semiconducting wafers, Data corrections, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Etching, Inspection, Control systems, Measurement devices, High volume manufacturing, Feedback control, Semiconducting wafers, Overlay metrology, Device simulation

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Double patterning technology, Critical dimension metrology, Molybdenum, Semiconducting wafers, Overlay metrology, Information operations

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Interferometers, Wavefronts, Projection systems, Semiconducting wafers, Phase shifts, Diffraction gratings

Showing 5 of 6 publications
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