Patrick Lomtscher
at Qoniac GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Metrology, Statistical analysis, Data modeling, Computer simulations, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling, Data corrections, Overlay metrology

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Reticles, Data modeling, Scanners, Distortion, Process control, Optical alignment, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Metrology, Data modeling, Manufacturing, Computer simulations, Optical alignment, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Reticles, Data modeling, Visualization, Optical alignment, Optimization (mathematics), Semiconducting wafers, Data corrections, Overlay metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Etching, Inspection, Control systems, Measurement devices, High volume manufacturing, Feedback control, Semiconducting wafers, Overlay metrology, Device simulation

Showing 5 of 8 publications
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