Patrick M. Martin
Head of Field Technology at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Conference Co-Chair | Conference Chair | Symposium Chair | Author
Publications (26)

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Etching, Ions, Photoresist materials, Extreme ultraviolet, Line width roughness, Ion implantation, Plasma etching, Line edge roughness, Semiconducting wafers, Plasma

SPIE Conference Volume | 20 October 2006

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Reticles, Optical lithography, Polarization, Birefringence, Wave plates, Pellicles, Photomasks, Critical dimension metrology, Fiber optic illuminators

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Data modeling, Polarization, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, System on a chip, Resolution enhancement technologies

Showing 5 of 26 publications
Conference Committee Involvement (8)
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask Technology
19 September 2006 | Monterey, California, United States
SPIE Photomask Technology
18 September 2006 | Monterey, United States
Showing 5 of 8 Conference Committees
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