Patrick Reynolds
President at Benchmark Technologies
SPIE Involvement:
Publications (11)

Proceedings Article | 9 April 2024 Presentation + Paper
Christine Schuster, Marina Heinrich, Anja Voigt, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Grützner
Proceedings Volume 12956, 129560H (2024)
KEYWORDS: Film thickness, Photoresist materials, Lithography, Ultraviolet radiation, Binary data, Grayscale lithography, Standards development, Optical lithography, Glasses, Photomasks

Proceedings Article | 9 April 2024 Poster + Paper
Sebastian Schermer, Christian Helke, Balaji Sake, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Anja Voigt, Danny Reuter
Proceedings Volume 12956, 129560J (2024)
KEYWORDS: Reticles, Etching, Dry etching, Manufacturing, Lens arrays, Grayscale lithography, Photoresist processing, Design, Scanning electron microscopy, Electron beam lithography

Proceedings Article | 20 October 2006 Paper
David Poon, James Dykes, Chinheng Choo, Jimmy T. Tsui, Jun Wang, Glenn Chapman, Yuqiang Tu, Patrick Reynolds, Andrew Zanzal
Proceedings Volume 6349, 634931 (2006)
KEYWORDS: Photomasks, Argon ion lasers, Binary data, Photoresist materials, Reticles, Optical lithography, Thin films, Calibration, Glasses, Oxidation

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61540D (2006)
KEYWORDS: Polarization, Reticles, Calibration, Polarimetry, Signal detection, Photomasks, Photoresist materials, Fiber optic illuminators, Lithographic illumination, Mask making

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61540Y (2006)
KEYWORDS: Data modeling, Scanning electron microscopy, Phase measurement, Calibration, Lithography, Semiconducting wafers, Photoresist materials, Photomasks, Optimization (mathematics), Error analysis

Showing 5 of 11 publications
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