Dr. Patrick Schiavone
Senior Research Scientist at CNRS
SPIE Involvement:
Author
Publications (64)

Proceedings Article | 27 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Analytics, Metrology, Optical lithography, Visualization, Image processing, Silicon, Doping, Scanning electron microscopy, Image quality, Process control, Optical proximity correction

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Electron beams, Image processing, Silicon, Diffusion, Scanning electron microscopy, Signal processing, Finite element methods

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Etching, Image processing, Image analysis, Scanning electron microscopy, Image quality, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Photonics, Photomasks, Beam shaping

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Data modeling, Silicon, Manufacturing, Data processing, Photomasks, Optical proximity correction, Photoresist processing, Tolerancing

Showing 5 of 64 publications
Conference Committee Involvement (6)
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
Modeling Aspects in Optical Metrology IV
13 May 2013 | Munich, Germany
Modeling Aspects in Optical Metrology
23 May 2011 | Munich, Germany
Modeling Aspects in Optical Metrology
15 June 2009 | Munich, Germany
Showing 5 of 6 Conference Committees
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