Dr. Patrick Steglich
Scientist at IHP
SPIE Involvement:
Author
Area of Expertise:
Photonics , Integrated Photonics , Electro-optical modulators , Biophotonics , Optical Technologies , Optical Sensors
Profile Summary

Patrick Steglich is a research associate at the Leibniz-Institute for Innovative Microelectronics IHP in Frankfurt (Oder), Germany. He is lecturer and guest scientist at the Technical University of Applied Sciences Wildau, Germany. He holds a master's degree in photonics from the Technical University of Applied Sciences Wildau since 2013. In 2016, he completed his PhD in photonics at Universita Roma 'Tor Vergata'. He is the author of more than 40 scientific articles and holds currently four patents in the field of photonics and optical technologies.
Publications (7)

Proceedings Article | 8 March 2019
Proc. SPIE. 10878, Photons Plus Ultrasound: Imaging and Sensing 2019
KEYWORDS: Sensors, Polymers, Refractive index, Chromophores, Electrodes, Photoacoustic spectroscopy, Cameras, Photorefractive polymers, Homogenization, Active optics

Proceedings Article | 4 March 2019
Proc. SPIE. 10931, MOEMS and Miniaturized Systems XVIII
KEYWORDS: Endoscopes, Endoscopy, Cameras, Filtering (signal processing), Sensors, Visualization, Data fusion, Inspection, Global Positioning System, 3D image processing

Proceedings Article | 4 March 2019
Proc. SPIE. 10902, Nonlinear Frequency Generation and Conversion: Materials and Devices XVIII
KEYWORDS: Raman spectroscopy, Gas lasers, Crystals, Raman scattering, Laser crystals, Carbon dioxide lasers, LIDAR, Light emitting diodes, Laser scattering, Diamond

Proceedings Article | 15 March 2018
Proc. SPIE. 10494, Photons Plus Ultrasound: Imaging and Sensing 2018
KEYWORDS: Sensors, Polymers, Polymer thin films, 3D acquisition, Ferroelectric polymers, Polymeric sensors, Photoacoustic spectroscopy, Acoustics, 3D image processing, Cameras

Proceedings Article | 26 June 2017
Proc. SPIE. 10329, Optical Measurement Systems for Industrial Inspection X
KEYWORDS: Silicon, Reflectance spectroscopy, Reflectometry, Etching, Spectroscopy, Microelectronics, Metrology, Semiconducting wafers, Algorithm development, Critical dimension metrology, Signal to noise ratio, Reflection, Photomasks, Spectral resolution, Diffraction

Showing 5 of 7 publications
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