Patrick Wong
Researcher Lithography Materials @ imec at IMEC
SPIE Involvement:
Author
Area of Expertise:
Lithography , Double Patterning , Process Development
Publications (21)

SPIE Journal Paper | August 17, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Critical dimension metrology, Metrology, Photomasks, Inspection, Optical proximity correction, Electron beam lithography, Etching

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Metrology, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Sensors, Etching, Scanners, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Data modeling, Deep ultraviolet, Etching, Metals, Electroluminescence, Optical proximity correction

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Light sources, Logic, Optical lithography, Modulation, Metals, Scanners, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Process control, Photomasks, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 21 publications
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