Patrick Wong
Researcher Lithography Materials @ imec at imec
SPIE Involvement:
Author
Area of Expertise:
Lithography , Double Patterning , Process Development
Publications (21)

SPIE Journal Paper | 17 August 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Critical dimension metrology, Metrology, Photomasks, Inspection, Optical proximity correction, Electron beam lithography, Etching

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconducting wafers, Stochastic processes, Scanning electron microscopy, Metrology, Electron beam lithography, Photomasks, Inspection, Critical dimension metrology, Optical proximity correction, Deep ultraviolet

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Overlay metrology, Critical dimension metrology, Optical lithography, Scanners, Semiconductors, Semiconducting wafers, Etching, Sensors, Reticles

Proceedings Article | 16 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Optical lithography, Light sources, Lithography, Deep ultraviolet, Data modeling, Electroluminescence, Logic, Metals, Optical proximity correction, Etching

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Light sources, Semiconducting wafers, Optical lithography, Critical dimension metrology, Logic, Line width roughness, Optical proximity correction, Metals, Scanners, Modulation

Showing 5 of 21 publications
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